Dual-precision analog memory cell and array

ABSTRACT

Dual-precision analog memory cells and arrays are provided. In some embodiments, a memory cell, comprises a non-volatile memory element having an input terminal and at least one output terminal; and a volatile memory element having a plurality of input terminals and an output terminal, wherein the output terminal of the volatile memory element is coupled to the input terminal of the non-volatile memory element, and wherein the volatile memory element comprises: a first transistor coupled between a first supply and a common node, and a second transistor coupled between a second supply and the common node; wherein the common node is coupled to the output terminal of the volatile memory element; and wherein gates of the first and second transistors are coupled to respective ones of the plurality of input terminals of the volatile memory element.

CROSS REFERENCE To RELATED APPLICATIONS

The present application is a continuation of U.S. patent applicationSer. No. 17/308,675, filed May 5, 2021, entitled “DUAL-PRECISION ANALOGMEMORY CELL AND ARRAY,” which is a continuation of U.S. patentapplication Ser. No. 16/693,332, filed Nov. 24, 2019, entitled“DUAL-PRECISION ANALOG MEMORY CELL AND ARRAY,” now U.S. Pat. No.11,069,391, which claims priority to U.S. Provisional Patent ApplicationNo. 62/773,991, filed Nov. 30, 2018, entitled “DUAL-PRECISION ANALOGMEMORY CELL.” The disclosures of all of the above-referencedapplications are incorporated by reference herein in their entirety.

TECHNICAL FIELD

The disclosure relates generally to computer technology, andparticularly, to memory elements for computer systems.

BACKGROUND

Many different types of memory elements are available for use in moderncomputer systems, with different performance trade-offs. These memorysystems include volatile and nonvolatile memory elements, both of whichmay be implemented in digital or analog form. The performance trade-offsinclude power consumption, speed, and duration of storage without power.

SUMMARY

In general, one aspect disclosed features a memory cell, comprising: anon-volatile memory element having an input terminal and at least oneoutput terminal; and a volatile memory element having a plurality ofinput terminals and an output terminal, wherein the output terminal ofthe volatile memory element is coupled to the input terminal of thenon-volatile memory element, and wherein the volatile memory elementcomprises: a first transistor coupled between a first supply and acommon node, and a second transistor coupled between a second supply andthe common node; wherein the common node is coupled to the outputterminal of the volatile memory element; and wherein gates of the firstand second transistors are coupled to respective ones of the pluralityof input terminals of the volatile memory element.

Embodiments of the memory cell may include one or more of the followingfeatures. In some embodiments, the first transistor is a P-typemetal-oxide-semiconductor (PMOS) transistor; and the second transistoris an N-type metal-oxide-semiconductor (NMOS) transistor. In someembodiments, the non-volatile memory element comprises a floating-gatetransistor, wherein a gate of the floating-gate transistor is coupled tothe input terminal of the non-volatile memory element, and wherein asource and a drain of the floating-gate transistor are coupled torespective ones of the at least one output terminal of the non-volatilememory element. In some embodiments, the non-volatile memory elementcomprises a ferro-electric transistor, wherein the ferro-electrictransistor comprises a third transistor and a ferroelectric capacitor,wherein the ferroelectric capacitor is coupled between a gate of thethird transistor and the input terminal of the non-volatile memoryelement, and wherein a source and a drain of the third transistor arecoupled to respective ones of the at least one output terminal of thenon-volatile memory element. In some embodiments, the non-volatilememory element further comprises: a third transistor coupled between thegate of the first transistor and a first word line, wherein a gate ofthe third transistor is coupled to a first bit line; and a fourthtransistor coupled between the gate of the second transistor and asecond word line, wherein a gate of the fourth transistor is coupled toa second bit line. In some embodiments, the non-volatile memory elementfurther comprises: a third transistor coupled between a source of thefirst transistor and the first supply, wherein a gate of the thirdtransistor is coupled to a first word line, and wherein the gate of thefirst transistor is coupled to a first bit line; and a fourth transistorcoupled between a drain of the second transistor and a second supply,wherein a gate of the fourth transistor is coupled to a second wordline, and wherein the gate of the second transistor is coupled to asecond bit line. In some embodiments, the first transistor is a firstsplit-gate transistor having a first gate and a second gate, wherein thefirst gate is coupled to a first word line, and wherein the second gateis coupled to a first bit line; and the second transistor is a secondsplit-gate transistor having a third gate and a fourth gate, wherein thethird gate is coupled to a second word line, and wherein the fourth gateis coupled to a second bit line.

In general, one aspect disclosed features a memory array, comprising: anarray of memory cells, wherein each memory cell comprises: anon-volatile memory element having an input terminal and at least oneoutput terminal; and a volatile memory element having a plurality ofinput terminals and an output terminal, wherein the output terminal ofthe volatile memory element is coupled to the input terminal of thenon-volatile memory element.

Embodiments of the memory array may include one or more of the followingfeatures. In some embodiments, the volatile memory element comprises: afirst transistor coupled between a first supply and a common node; and asecond transistor coupled between a second supply and the common node;wherein the common node is coupled to the output terminal of thevolatile memory element; and wherein gates of the first and secondtransistors are coupled to respective ones of the plurality of inputterminals of the volatile memory element. In some embodiments, the firsttransistor is a P-type metal-oxide-semiconductor (PMOS) transistor; andthe second transistor is an N-type metal-oxide-semiconductor (NMOS)transistor. In some embodiments, the non-volatile memory elementcomprises a floating-gate transistor, wherein a gate of thefloating-gate transistor is coupled to the input terminal of thenon-volatile memory element, and wherein a source and a drain of thefloating-gate transistor are coupled to respective ones of the at leastone output terminal of the non-volatile memory element. In someembodiments, the non-volatile memory element comprises a ferro-electrictransistor, wherein the ferro-electric transistor comprises a thirdtransistor and a ferroelectric capacitor, wherein the ferroelectriccapacitor is coupled between a gate of the third transistor and theinput terminal of the non-volatile memory element, and wherein a sourceand a drain of the third transistor are coupled to respective ones ofthe at least one output terminal of the non-volatile memory element.Some embodiments comprise a control circuit configured to apply a firstvoltage pulse to the gate of the first transistor, and to apply a secondvoltage pulse to the gate of the second transistor; wherein a charge atthe common node increases by a fixed amount responsive to the firstvoltage pulse; and wherein the charge at the common node decreases bythe fixed amount responsive to the second voltage pulse. In someembodiments, the control circuit is further configured to modify a valuestored in the non-volatile memory element according to a level of thecharge at the common node.

In general, one aspect disclosed features a neural network, comprising:an array of memory cells, wherein each memory cell comprises: anon-volatile memory element having an input terminal and at least oneoutput terminal; and a volatile memory element having a plurality ofinput terminals and an output terminal, wherein the output terminal ofthe volatile memory element is coupled to the input terminal of thenon-volatile memory element.

Embodiments of the neural network may include one or more of thefollowing features. In some embodiments, the volatile memory elementcomprises: a first transistor coupled between a first supply and acommon node; and a second transistor coupled between a second supply andthe common node; wherein the common node is coupled to the outputterminal of the volatile memory element; and wherein gates of the firstand second transistors are coupled to respective ones of the pluralityof input terminals of the volatile memory element. In some embodiments,the first transistor is a P-type metal-oxide-semiconductor (PMOS)transistor; and the second transistor is an N-typemetal-oxide-semiconductor (NMOS) transistor. In some embodiments, acontrol circuit configured to apply a first voltage pulse to the gate ofthe first transistor, and to apply a second voltage pulse to the gate ofthe second transistor, during a training phase of the neural network;wherein a charge at the common node increases by a fixed amountresponsive to the first voltage pulse; and wherein the charge at thecommon node decreases by the fixed amount responsive to the secondvoltage pulse. In some embodiments, the control circuit is furtherconfigured to modify a value stored in the non-volatile memory elementaccording to a level of the charge at the common node during an updatephase of the neural network. In some embodiments, the control circuit isfurther configured to read the value stored in the non-volatile memoryelement during an inference phase of the neural network.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which constitute a part of this disclosure,illustrate several non-limiting embodiments and, together with thedescription, serve to explain the disclosed principles.

FIG. 1 illustrates a dual precision analog memory cell according to oneembodiment.

FIG. 2 illustrates a dual precision analog memory cell using CMOStransistors according to one embodiment.

FIG. 3 illustrates an analog dual precision memory cell that includes afloating gate transistor.

FIG. 4 illustrates an analog dual precision memory cell that includes aferro-electric transistor.

FIGS. 5-7 illustrate biasing schemes for a neural network training phasefor the dual precision analog memory cell of FIG. 2 .

FIG. 5 illustrates a biasing scheme for increasing a weight stored in amemory cell.

FIG. 6 illustrates a biasing scheme for decreasing a weight stored in amemory cell.

FIG. 7 illustrates a biasing scheme for reading a weight stored in amemory cell.

FIGS. 8-10 illustrate biasing schemes for a neural network update phasefor the dual precision analog memory cell of FIG. 2 .

FIG. 9 illustrates a biasing scheme for setting the nonvolatile memoryelement of the memory cell.

FIG. 10 illustrates a biasing scheme for resetting a nonvolatile memoryelement of a memory cell.

FIG. 11 shows one implementation of an array of dual precisionnonvolatile memory cells according to one embodiment.

FIG. 12 shows an implementation of a dual precision nonvolatile memorycell using gate biasing transistors to allow independent updates ofvolatile memory elements in an array according to one embodiment.

FIG. 13 shows an implementation of a dual precision nonvolatile memorycell using cascade transistors to allow independent updates of volatilememory elements in an array according to one embodiment.

FIG. 14 shows an implementation of a dual precision nonvolatile memorycell using split-gate transistors to allow independent updates ofvolatile memory elements in an array according to one embodiment.

DETAILED DESCRIPTION OF THE EMBODIMENTS

Reference will now be made in detail to exemplary embodiments, examplesof which are illustrated in the accompanying drawings. The followingdescription refers to the accompanying drawings in which the samenumbers in different drawings represent the same or similar elementsunless otherwise represented. The implementations set forth in thefollowing description of exemplary embodiments consistent with thepresent invention do not represent all implementations consistent withthe invention. Instead, they are merely examples of systems and methodsconsistent with aspects related to the invention.

Some current computer technologies include multiple phases, withdifferent levels of memory precision required for different phases. Onesuch technology is neural networks, which include training phases andinference phases. During neural network training phases, high precisionis desired to accumulate small changes to the weights of the neuralnetwork. But during inference phases, lower bit precision can betolerated without sacrificing accuracy. For example, with deep neuralnetworks, a relatively higher precision (for example, using a relativelylarge number of bits) is needed during training to accumulateincremental weight changes. But during inference phases, a relativelylower precision (for example, using a relatively low number of bits) issufficient to achieve the desired accuracy.

Continuing with the example of neural networks, the use of analogmultilevel nonvolatile memory elements is increasingly popular, forexample due to their high speed and low power consumption. But analognonvolatile memory elements suffer from several drawbacks. For example,the number of bits that can be controlled by an analog nonvolatilememory element is limited. Among current commercially available analognonvolatile memory elements, the highest precision available is 4 bits,for example. And because these solutions are standalone storage productsrequiring heavy error correction, they are unsuitable for neural networkapplications.

Furthermore, these analog nonvolatile memory elements suffer fromunacceptable accuracy degradation resulting from factors such as limiteddynamic range, variation, and most importantly asymmetric and nonlinearweight updates. As such, these analog nonvolatile memory elements are sofar unsuitable for neural network applications.

The disclosed embodiments provide dual-precision analog memory cells.These memory cells include a high precision volatile memory elementcoupled with a low precision nonvolatile memory element. These memorycells are ideal for applications such as neural networks. However, thesememory cells are not limited to use in neural networks, and may be usedin other computer technologies as well.

Returning to the neural network example, during training phases, thevolatile memory element accumulates high precision data, using arelatively high number of bits. After each training phase, the highprecision data accumulated in the volatile memory element may betransferred to the nonvolatile memory element. During neural networkinference phases the data stored in the nonvolatile memory element maybe read.

FIG. 1 illustrates a dual precision analog memory cell 100 according toone embodiment. Referring to FIG. 1 , the dual precision analog memorycell 100 includes a nonvolatile memory element 104 and a volatile memoryelement 106. The nonvolatile memory element 104 includes an inputterminal 101, and output terminals 102 and 103, but may include moreterminals, for example to support other functions. The volatile memoryelement 106 includes two voltage-controlled current sources 108, 110.The output of one voltage-controlled current source 108, and the inputof the other voltage-controlled current source 110, are coupled togetherat a common node C, which serves as an output terminal of thenonvolatile memory element 104, and is coupled to the input terminal 101of the nonvolatile memory element 104. Various embodiments may alsoinclude one or more control circuits 120 to control one or more of thememory cells disclosed herein.

The current generated by each voltage-controlled current source 108, 110is a function of the voltage applied to the control terminal of thecurrent source. For example, referring to FIG. 1 , the current generatedby voltage-controlled current source 108 is a function of the voltage G+(for example, the function may be f+=Vdd−G+), and the current generatedby voltage-controlled current source 110 is a function of the voltage G−(for example, the function may be f−=G−−Vss). In one example, thecurrent generated by each voltage-controlled current source 108, 110 isproportional to the voltage applied to the control terminal. Manydevices are suitable for implementing the voltage-controlled currentsources 108, 110. In some embodiments, the voltage-controlled currentsources 108, 110 are implemented using complementary metal oxidesemiconductor technology (CMOS) transistors.

FIG. 2 illustrates a dual precision analog memory cell 200 using CMOStransistors according to one embodiment. Referring to FIG. 2 , the dualprecision analog memory cell 200 includes a nonvolatile memory element104 and a volatile memory element 206. The nonvolatile memory element104 includes an input terminal 101, and output terminals 102 and 103.The volatile memory element 206 includes a pull-up transistor 208 and apull-down transistor 210. In the example of FIG. 2 , the pull-uptransistor 208 is implemented as a P-type metal-oxide-semiconductor(PMOS) transistor, and the pull-down transistor 210 is implemented as anN-type metal-oxide-semiconductor (NMOS) transistor. The drain of thePMOS pull-up transistor 208, and the source of the NMOS pull-downtransistor 210, are coupled together at a common node C, which iscoupled to the input terminal 101 of the nonvolatile memory element 104.

In the described embodiments, the pull-up transistor 208, and thepull-down transistor 210, are implemented using complementary metaloxide semiconductor technology (CMOS). However, other technologies maybe used. For example, the pull-up transistor 208, and the pull-downtransistor 210, may be implemented as tunnel field-effect transistors(TFET) or the like. Compared with CMOS, the use of TFET allows thepotential to achieve even lower leakage currents and better retentionfor the volatile memory element 206.

It is possible to replace the combination of the pull-up transistor 208,and the pull-down transistor 210, with a single transistor. But bybalancing the leakage currents of the pull-up transistor 208, and thepull-down transistor 210, the charge stored in the common node C can bekept for a much longer time compared to a single-transistor structure.When the disclosed dual precision analog memory cells are used in neuralnetworks, this greatly increased retention time allows a longer durationfor each training cycle, resulting in greater accuracy.

According to various embodiments, the nonvolatile memory element 104satisfies three requirements. First, the voltage at the input terminal101 can modulate the current and/or conductance between terminal 102 andterminal 103. Second, the nonvolatile memory element 104 includes anonvolatile memory element that can be programmed to multiple statesbased on the voltage at the input terminal 101. Third, the nonvolatilememory element can be modified by applying a voltage between inputterminal 101 and terminal 102, or between input terminal 101 andterminal 103. Example nonvolatile memory elements 104 that satisfy thesethree requirements include floating-gate transistors and ferro-electrictransistors. But other devices that satisfy these three requirements maybe used.

FIG. 3 illustrates an analog dual precision memory cell 300 thatincludes a floating gate transistor 304 having a floating gate 305. Thefloating gate transistor 304 may be implemented using CMOS, TFET, or thelike. Referring to FIG. 3 , the drain of the PMOS pull-up transistor208, and the source of the NMOS pull-down transistor 210, are coupledtogether at a common node C, and to the floating gate 305 of thefloating gate transistor 304.

FIG. 4 illustrates an analog dual precision memory cell 400 thatincludes a ferro-electric transistor 404 having an input terminal 401.Referring to FIG. 4 , the ferro-electric transistor 404 includes atransistor 406, and a ferroelectric capacitor 405 coupled between theinput terminal 401 and the transistor 406. The drain of the PMOS pull-uptransistor 208, and the source of the NMOS pull-down transistor 210, arecoupled together at a common node C, and to the input terminal 401 ofthe ferro-electric transistor 404.

Referring again to FIG. 2 , operation of the analog dual precisionmemory cell 200 is now described in the context of neural networks. Thevalue stored in memory cell 200, also referred to herein as a neuralnetwork weight, is represented by a combination of lower bits and upperbits. The lower bits are represented by the charge between the pull-uptransistor 208 and the pull-down transistor 210. This charge can changecontinuously during neural network training, and represents a relativelyhigh number of bits. Each time the pull-up transistor 208 is turned on,the common node C is charged by a fixed amount q. Each time thepull-down transistor 210 is turned on, the common node C is dischargedby the fixed amount q. These operations allow multi-bit storage andcontinuous tuning. The upper bits are represented by the state of thenonvolatile memory element 104, using a relatively low number of bits.

In neural networks, the training process is divided into multipletraining phases separated by update phases. For example, each trainingphase may last for 1-10 ms. During each training phase, training dataare fed into the neural network, and thereby modify the weights storedin the volatile element 206 of the memory cell 200. During each updatephase, the accumulated charge in the volatile memory element 206 is readout, and if the charge exceeds certain thresholds, the value representedby the charge is carried over to the upper bits by programming thenonvolatile memory element 104. After reading, the value of the volatilememory element 206 is restored to a neutral level. For example, thecharge at the common node C is restored to a charge in the middle of therange of possible charges. In this way, the disclosed dual precisionanalog memory elements may be used to transition seamlessly betweentraining and inference phases for neural networks.

After the neural network training process is completed, an inferenceprocess may be executed. During the inference process, only the upperbits are required. The lower bits, represented by the charge at thecommon node C of the volatile memory element 206, may be ignored withoutsacrificing the accuracy of the inference. Because the volatile memoryelement 206 requires far less power than a nonvolatile memory element,the trained results may be saved using far less power than a solutionemploying nonvolatile memory elements only.

FIGS. 5-6 illustrate biasing schemes for a neural network training phasefor the dual precision analog memory cell 200 of FIG. 2 . FIG. 5illustrates a biasing scheme for increasing the weight stored in thedual precision analog memory cell 200 of FIG. 2 . Referring to FIG. 5 ,the source of the pull-up transistor 208 is biased at Vdd, and the drainof the pull-down transistor 210 is biased at Vss. The output terminals102 and 103 of the nonvolatile memory element 104, and the inputterminal G− of the pull-down transistor 210, are biased at a relativelylow voltage Vlow. With this biasing, and by applying a voltage pulseVlow at the input terminal G+ of the pull-up transistor 208, the commonnode C is charged by a fixed charge q, as shown in FIG. 5 .

FIG. 6 illustrates a biasing scheme for decreasing the weight stored inthe dual precision analog memory cell 200 of FIG. 2 . Referring to FIG.6 , the source of the pull-up transistor 208 is biased at Vdd, and thedrain of the pull-down transistor 210 is biased at Vss. The outputterminals 102 and 103 of the nonvolatile memory element 104 are biasedat Vlow. The input terminal G+ of the pull-up transistor 208 is biasedat a relatively high voltage Vhigh. With this biasing, and by applying avoltage pulse Vhigh at the input terminal G− of the pull-down transistor210, the common node C is discharged by a fixed charge q, as shown inFIG. 6 .

FIG. 7 illustrates a biasing scheme for reading the weight stored in thedual precision analog memory cell 200 of FIG. 2 . Referring to FIG. 7 ,the source of the pull-up transistor 208 is biased at VreadG, and thedrain of the pull-down transistor 210 is biased at Vss. The inputterminal G+ of the pull-up transistor 208, and the input terminal G− ofthe pull-down transistor 210, are biased at Vlow. With this biasing, theweight stored in the memory cell 200 may be read by applying voltagesVread and Vlow at the output terminals 102 and 103, respectively, of thenonvolatile memory element 104, as shown in FIG. 7 , or alternatively byapplying voltages Vread and Vlow at the output terminals 103 and 102,respectively, of the nonvolatile memory element 104. In either case, theweight stored in the memory cell 200 may be read by reading the currentflowing between the output terminals 103 and 102.

FIGS. 8-10 illustrate biasing schemes for a neural network update phasefor the dual precision analog memory cell 200 of FIG. 2 . FIG. 8illustrates a biasing scheme for reading the weight stored in the dualprecision analog memory cell 200 of FIG. 2 . Referring to FIG. 8 , thedrain of the pull-down transistor 210 is biased at Vss. The inputterminal G+ of the pull-up transistor 208, and the input terminal G− ofthe pull-down transistor 210, are biased at Vlow. The source of thepull-up transistor 208 is biased at a voltage VreadG. With this biasing,the weight stored in the memory cell 200 may be read by applyingvoltages Vread and Vlow at the output terminals 102 and 103,respectively, of the nonvolatile memory element 104, as shown in FIG. 8, or alternatively by applying voltages Vread and Vlow at the outputterminals 103 and 102, respectively, of the nonvolatile memory element104. In either case, the weight stored in the memory cell 200 may beread by reading the current flowing between the output terminals 103 and102.

FIG. 9 illustrates a biasing scheme for setting the nonvolatile memoryelement 104 of the dual precision analog memory cell 200 of FIG. 2 .Referring to FIG. 9 , the drain of the pull-down transistor 210 isbiased at Vss. The input terminal G+ of the pull-up transistor 208, andthe input terminal G− of the pull-down transistor 210, are biased atVlow. The source of the pull-up transistor 208 is biased at a voltageVsetG. With this biasing, the nonvolatile memory element 104 of thememory cell 200 may be set by applying voltages Vset and Vlow at theoutput terminals 102 and 103, respectively, of the nonvolatile memoryelement 104, as shown in FIG. 9 , or alternatively by applying voltagesVset and Vlow at the output terminals 103 and 102, respectively, of thenonvolatile memory element 104. In response, the nonvolatile memoryelement 104 of the memory cell 200 is set to a level that conducts morecurrent between the output terminals 102 and 103.

FIG. 10 illustrates a biasing scheme for resetting the nonvolatilememory element 104 of the dual precision analog memory cell 200 of FIG.2 . Referring to FIG. 10 , the drain of the pull-down transistor 210 isbiased at Vss. The input terminal G+ of the pull-up transistor 208, andthe input terminal G− of the pull-down transistor 210, are biased atVlow. The source of the pull-up transistor 208 is biased at a voltageVresetG. With this biasing, the nonvolatile memory element 104 of thememory cell 200 may be reset by applying voltages Vreset and Vlow at theoutput terminals 102 and 103, respectively, of the nonvolatile memoryelement 104, as shown in FIG. 10 , or alternatively by applying voltagesVreset and Vlow at the output terminals 103 and 102, respectively, ofthe nonvolatile memory element 104. In response, the nonvolatile memoryelement 104 of the memory cell 200 is reset to a level that conductsless current between the output terminals 102 and 103.

FIG. 11 shows one implementation of an array 1100 of the dual precisionnonvolatile memory cells 200 of FIG. 2 according to one embodiment.Referring to FIG. 11 , the array 1100 includes two dual precision memorycells 200A,B. The dual precision memory cell 200A includes a pull-uptransistor 208A, a pull-down transistor 210A, and a nonvolatile memoryelement (NVM) 104A having terminals 101A, 102A, and 103B. The dualprecision memory cell 200B includes a pull-up transistor 208B, apull-down transistor 210B, and a nonvolatile memory element (NVM) 104Bhaving terminals 101B, 102B, and 103B.

The output terminals 102A,B of the memory cells 200A,B are coupled torespective bit lines BLA,BLB, and the output terminals 103A,B of thememory cells 200A,B are coupled to a common source line SL, which iscoupled to a sense amplifier SA. If the gates G+ of the pull-uptransistors 208A,B are coupled to the same word line, or if the gates G−of the pull-down transistors 210A,B are coupled to the same word line,the weights of the lower bits of the memory cells 200A,B will always beupdated together. In some embodiments, it may be desirable to update thepull-up transistors 208A,B (or the pull-down transistors 210A,B)independently.

FIG. 12 shows an implementation of a dual precision nonvolatile memorycell 1200 using gate biasing transistors to allow independent updates ofvolatile memory elements 206 in an array of the dual precisionnonvolatile memory cells 200 of FIG. 2 according to one embodiment.Referring to FIG. 12 , each transistor 208, 210 is independently biasedby a transistor 1202A,B, respectively. In particular, the gate of NMOStransistor 1202A is biased by a signal BL_G+, while the gate of PMOStransistor 1202B is biased by a signal BL_G−. And transistor 1202A iscoupled between the gate of the pull-up transistor 208 and a word linesignal WLa, while transistor 1202B is coupled between the gate of thepull-down transistor 210 and a word line signal WLb. This approachrequires the addition of at least two transistors 1202 to each memorycell 1200.

FIG. 13 shows an implementation of a dual precision nonvolatile memorycell 1300 using cascade transistors to allow independent updates ofvolatile memory elements 206 in an array of the dual precisionnonvolatile memory cells 200 of FIG. 2 according to one embodiment.Referring to FIG. 13 , cascade transistors 1302A,B are added totransistors 208,210, respectively. In particular, the cascade transistor1302A is coupled between the source of the pull-up transistor 208 andthe supply Vdd, with the gate of the cascade transistor 1302A coupled toword line WLa. The gate of the pull-up transistor 208 is coupled tosignal BL_G+. The cascade transistor 1302B is coupled between the drainof the pull-down transistor 210 and the supply Vss, with the gate of thecascade transistor 1302B coupled to word line WLb. The gate of thepull-down transistor 210 is coupled to signal BL_G−. The cascadetransistors 1302A,B may be implemented using CMOS, TFET, or the like. Inthe illustrated embodiment, charges are shared by transistors 208 and1302A at node 1304A, and by transistors 210 and 1302B at node 1304B.

One implementation resolves this charge-sharing problem using split-gatetransistors. FIG. 14 shows an implementation of a dual precisionnonvolatile memory cell 1400 using split-gate transistors to allowindependent updates of volatile memory elements 206 in an arrayaccording to one embodiment. Split-gate transistors are described inShur, M., “Split-gate field-effect transistor,” Applied Physics Letters,54(2), 162-164 (1989). Compared with the dual precision analog memorycell of FIG. 2 , the PMOS pull-up transistor 208 of FIG. 2 is replacedby a split-gate PMOS transistor 1408, while the NMOS pull-downtransistor 210 of FIG. 2 is replaced by a split-gate NMOS transistor1410. Alternatively, the split-gate transistors 1408,1410 may beimplemented using TFET, or the like. The gates of the pull-up split-gatetransistor 1408 are coupled to word line WLa and signal BL_G+,respectively, while the gates of the pull-down split-gate transistor1410 are coupled to word line WLb and signal BL_G−, respectively. Theuse of the split-gate transistors 1408,1410 eliminates thecharge-sharing nodes 1304A,B of the dual precision nonvolatile memorycell 1300 of FIG. 13 , while allowing independent updates of thevolatile memory elements 206 in an array.

While examples and features of disclosed principles are describedherein, modifications, adaptations, and other implementations arepossible without departing from the spirit and scope of the disclosedembodiments. Also, the words “comprising,” “having,” “containing,” and“including,” and other similar forms are intended to be equivalent inmeaning and be open ended in that an item or items following any one ofthese words is not meant to be an exhaustive listing of such item oritems, or meant to be limited to only the listed item or items. It mustalso be noted that as used herein and in the appended claims, thesingular forms “a,” “an,” and “the” include plural references unless thecontext clearly dictates otherwise.

It will be appreciated that the present invention is not limited to theexact construction that has been described above and illustrated in theaccompanying drawings, and that various modifications and changes can bemade without departing from the scope thereof.

What is claimed is:
 1. An apparatus comprising: a dual-precision analogmemory cell comprising: a non-volatile memory element having an inputterminal, a first output terminal, and a second output terminal, avolatile memory element comprising: a first transistor having a drainelectrically coupled to the input terminal of the non-volatile memoryelement, and a second transistor having a source electrically coupled tothe input terminal of the non-volatile memory element; and a controllerconfigured to increase a weight stored in the dual precision analogmemory cell by: biasing a source of the first transistor to a highsupply voltage, biasing a drain of the second transistor to a low supplyvoltage, biasing a gate of the second transistor at a low voltage,biasing the first and second output terminals of the non-volatile memoryelement at the low voltage, and applying a high voltage followed by alow voltage pulse to a gate of the first transistor, wherein the highvoltage is higher than the low voltage.
 2. The apparatus of claim 1,wherein applying the high voltage followed by the low voltage pulse tothe gate of the first transistor charges the input terminal of thenon-volatile memory element by a fixed charge q.
 3. The memory cell ofclaim 1, wherein: the non-volatile memory element comprises afloating-gate transistor, wherein a gate of the floating-gate transistoris coupled to the input terminal of the non-volatile memory element, andwherein a source and a drain of the floating-gate transistor are coupledto respective ones of the first and second output terminals of thenon-volatile memory element.
 4. The memory cell of claim 1, wherein: thenon-volatile memory element comprises a ferro-electric transistor,wherein the ferro-electric transistor comprises a third transistor and aferroelectric capacitor, wherein the ferroelectric capacitor is coupledbetween a gate of the third transistor and the input terminal of thenon-volatile memory element, and wherein a source and a drain of thethird transistor are coupled to respective ones of the first and secondterminals of the non-volatile memory element.
 5. The memory cell ofclaim 1, wherein the non-volatile memory element further comprises: athird transistor coupled between the gate of the first transistor and afirst word line, wherein a gate of the third transistor is coupled to afirst bit line; and a fourth transistor coupled between the gate of thesecond transistor and a second word line, wherein a gate of the fourthtransistor is coupled to a second bit line.
 6. The memory cell of claim1, wherein: the first transistor is a first split-gate transistor havinga first gate and a second gate, wherein the first gate is coupled to afirst word line, and wherein the second gate is coupled to a first bitline; and the second transistor is a second split-gate transistor havinga third gate and a fourth gate, wherein the third gate is coupled to asecond word line, and wherein the fourth gate is coupled to a second bitline.
 7. An apparatus comprising: a dual-precision analog memory cellcomprising: a non-volatile memory element having an input terminal, afirst output terminal, and a second output terminal, a volatile memoryelement comprising: a first transistor having a drain electricallycoupled to the input terminal of the non-volatile memory element, and asecond transistor having a source electrically coupled to the inputterminal of the non-volatile memory element; and a controller configuredto decrease a weight stored in the dual precision analog memory cell by:biasing a source of the first transistor to a high supply voltage,biasing a drain of the second transistor to a low supply voltage,biasing a gate of the first transistor at a high voltage, biasing thefirst and second output terminals of the non-volatile memory element atthe low voltage, and applying a low voltage followed by a high voltagepulse to a gate of the second transistor, wherein the high voltage ishigher than the low voltage.
 8. The apparatus of claim 7, whereinapplying the high voltage followed by the low voltage pulse to the gateof the first transistor charges the input terminal of the non-volatilememory element by a fixed charge q.
 9. The memory cell of claim 7,wherein: the non-volatile memory element comprises a floating-gatetransistor, wherein a gate of the floating-gate transistor is coupled tothe input terminal of the non-volatile memory element, and wherein asource and a drain of the floating-gate transistor are coupled torespective ones of the first and second output terminals of thenon-volatile memory element.
 10. The memory cell of claim 7, wherein:the non-volatile memory element comprises a ferro-electric transistor,wherein the ferro-electric transistor comprises a third transistor and aferroelectric capacitor, wherein the ferroelectric capacitor is coupledbetween a gate of the third transistor and the input terminal of thenon-volatile memory element, and wherein a source and a drain of thethird transistor are coupled to respective ones of the first and secondterminals of the non-volatile memory element.
 11. The memory cell ofclaim 7, wherein the non-volatile memory element further comprises: athird transistor coupled between the gate of the first transistor and afirst word line, wherein a gate of the third transistor is coupled to afirst bit line; and a fourth transistor coupled between the gate of thesecond transistor and a second word line, wherein a gate of the fourthtransistor is coupled to a second bit line.
 12. The memory cell of claim7, wherein: the first transistor is a first split-gate transistor havinga first gate and a second gate, wherein the first gate is coupled to afirst word line, and wherein the second gate is coupled to a first bitline; and the second transistor is a second split-gate transistor havinga third gate and a fourth gate, wherein the third gate is coupled to asecond word line, and wherein the fourth gate is coupled to a second bitline.
 13. An apparatus comprising: a dual-precision analog memory cellcomprising: a non-volatile memory element having an input terminal, afirst output terminal, and a second output terminal, a volatile memoryelement comprising: a first transistor having a drain electricallycoupled to the input terminal of the non-volatile memory element, and asecond transistor having a source electrically coupled to the inputterminal of the non-volatile memory element; and a controller configuredto read a weight stored in the dual precision analog memory cell by:biasing a source of the first transistor to a read voltage, biasing adrain of the second transistor to a low supply voltage, biasing a gateof the first transistor at a low voltage, biasing a gate of the secondtransistor at the low voltage, and biasing the first output terminal ofthe non-volatile memory element at the read voltage and the secondoutput terminal of the non-volatile memory element at the low voltage,wherein the high voltage is higher than the low voltage.
 14. Theapparatus of claim 13, wherein the controller is further configured to:reading a current flowing between the first output terminal of thenon-volatile memory element and the second output terminal of thenon-volatile memory element.
 15. The memory cell of claim 13, wherein:the non-volatile memory element comprises a floating-gate transistor,wherein a gate of the floating-gate transistor is coupled to the inputterminal of the non-volatile memory element, and wherein a source and adrain of the floating-gate transistor are coupled to respective ones ofthe first and second output terminals of the non-volatile memoryelement.
 16. The memory cell of claim 13, wherein: the non-volatilememory element comprises a ferro-electric transistor, wherein theferro-electric transistor comprises a third transistor and aferroelectric capacitor, wherein the ferroelectric capacitor is coupledbetween a gate of the third transistor and the input terminal of thenon-volatile memory element, and wherein a source and a drain of thethird transistor are coupled to respective ones of the first and secondterminals of the non-volatile memory element.
 17. The memory cell ofclaim 13, wherein the non-volatile memory element further comprises: athird transistor coupled between the gate of the first transistor and afirst word line, wherein a gate of the third transistor is coupled to afirst bit line; and a fourth transistor coupled between the gate of thesecond transistor and a second word line, wherein a gate of the fourthtransistor is coupled to a second bit line.
 18. The memory cell of claim13, wherein: the first transistor is a first split-gate transistorhaving a first gate and a second gate, wherein the first gate is coupledto a first word line, and wherein the second gate is coupled to a firstbit line; and the second transistor is a second split-gate transistorhaving a third gate and a fourth gate, wherein the third gate is coupledto a second word line, and wherein the fourth gate is coupled to asecond bit line.